RXMARINE CHEMICAL TAG::
Description::
Application::
T 1476 (OTTO) Tetramethylammonium hydroxide 25% in methanol - used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist.
Technical Specifications::
Dose::
KOH and TMAH are anisotropic silicon etches, used to make V-grooves, membranes, and holes through wafers, as well as other devices. ... KOH is simply the hydroxide of potassium. TMAH is a organic hydroxide and stands for Tetramethyl ammonium hydroxide.
Product remark::
Industrial Usages::
Useful Area::
Related Information::
Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanoparticle aggregation.