RXMARINE CHEMICAL TAG::
Description::
Application::
TMAH solution is widely used in the electronics industry as a developer or cleaner. TMAH is typically one of several ingredients in etching / stripping mixtures, although it may also be used as a pure chemical. It is often used in solution in water, and less frequently, in methanol.
Technical Specifications::
Dose::
Buffered Oxide Etch (BOE) or just hydrofluoric acid is used for etching silicon dioxide on silicon wafers. Buffered oxide etch is a mixture of hydrofluoric acid and ammonium fluoride. Ammonium fluoride containing etches give silicon surfaces with an atomically smoother surface than HF.
Product remark::
Industrial Usages::
Useful Area::
Related Information::
KOH and TMAH are anisotropic silicon etches, used to make V-grooves, membranes, and holes through wafers, as well as other devices. ... KOH is simply the hydroxide of potassium. TMAH is a organic hydroxide and stands for Tetramethyl ammonium hydroxide.